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- PVA TePla IoN 10V / 40 / 100 Gas Plasma Systems
PVA TePla IoN 10V / 40 / 100 Gas Plasma Systems
Model: PVA TePla IoN 10V / 40 / 100
Category: Machines & Equipments for PCB / PCB Wet Process Equipment / Plasma Cleaning and Surface Treatment Machine
Characteristics
The IoN 10V plasma system is our latest advance-ment in RF plasma processing. This low cost, mid-sized wafer batch asher is loaded with advanced features and targets the needs of small scale found-ries, universities and start-up companies. The IoN 10V is equipped with new, state of the art components and software to precisely control pro-cessing parameters. This technology has been suc-cessfully used for power transistors, analog devic-es, sensors, optical devices, photonics, MEMS/MOEMS, bio devices, etc. The small footprint of the IoN 10V requires minimal laboratory space and provides for simple installation and maintenance. Leveling casters and brakes al-low for easy installation and flexibility.
PVA TePla IoN 40 Gas Plasma System
Full featured plasma surface modification!
‧ Flexible electrode design for improved process
uniformity
‧ Industrial computer with a WindowsR based system
‧ Graphical User Interface (GUI) with large touch screen
Software written to Semi E95-1101 and FDA CFR Title 21
Part II
‧ Recipe driven processes
‧ Self diagnostic features and graphing
‧ Ethernet communications
‧ Energy saving control features
‧ Alternate gas selector
‧ Simple plug and play installation
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Specs
Features include:
Small foot print design
Stainless Steel chamber accommodating up to 8” wafers
7” Touch Screen PC Controller with auto and Manual mode operation
User access control for process development and maintenance programming.
Plug and play installation
Pressure Control
Typical application:
Photo-resist stripping
Wafer descum
Wafer cleaning prior to wet etching
SU-8 removal
Eching of passivation layers
RIE Configurable
PVA TePla IoN Series is designed to meet the evolving demands of our customers, emphasizing versatility and control for their surface treatment needs. Its advanced features provide state of the art process control, fail-safe system alarms and data capturing software. This enables the systems to meet stringent quality control programs in the Life Science industries. The IoN Series uses radio frequency (RF) generated plasma in a compact, fully integrated package. Another design feature of the IoN Series is the ability to quickly and easily alternate between different chamber types and electrode configurations.
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